GaAs metal-oxide-semiconductor capacitors using atomic layer deposition of HfO2 gate dielectric: Fabrication and characterization

Author
D. Shahrjerdi
D. I. Garcia-Gutierrez
T. Akyol
Seth R. Bank
Emanuel Tutuc
J. C. Lee
Sanjay K. Banerjee
Year Published
2007
Journal
APL
Volume
91
Number of Pages
193503
Month Published
09
URL
http://dx.doi.org/10.1063/1.2806190
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