Publications

Displaying 9 publications
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Conference Paper

  1. S. J. Maddox, A. P. Vasudev, V. D. Dasika, S. D. March, M. L. Brongersma, and S. R. Bank, "Effects of Growth Rate, Substrate Temperature, and a Bi Surfactant on Doping Limits in InAs:Si Grown by Molecular Beam Epitaxy," 56th Electronic Materials Conf. (EMC), Santa Barbara, CA, Jun 2014.
  2. S. J. Maddox, A. P. Vasudev, V. D. Dasika, M. L. Brongersma, and S. R. Bank, "Exploring the Limits of Silicon Doping in InAs for Mid-Infrared Plasmonics," North American Molecular Beam Epitaxy Conf. (NAMBE), Banff, Alberta, Canada, Oct 2013.
  3. E. M. Krivoy, A. P. Vasudev, H. P. Nair, V. D. Dasika, R. A. Synowicki, R. Salas, S. J. Maddox, M. L. Brongersma, and S. R. Bank, "Tunable, Epitaxial, Semimetallic Films for Plasmonics," Conf. on Lasers and Electro Optics (CLEO), San Jose, CA, Jun 2013.
  4. A. P. Vasudev, S. J. Maddox, J. Kang, S. R. Bank, and M. L. Brongersma, "Tunable Mid-infrared Semiconductor Plasmonics," Materials Research Society (MRS) Spring Meeting, San Francisco, CA, Apr 2013.
  5. S. J. Maddox, A. P. Vasudev, V. D. Dasika, M. L. Brongersma, and S. R. Bank, "Bismuth Surfactant-Mediated Epitaxy of Highly Doped InAs for Mid-Infrared Plasmonics," North American Molecular Beam Epitaxy Conf. (NAMBE), Stone Mountain Park, GA, Oct 2012.
  6. A. P. Vasudev, S. J. Maddox, M. L. Brongersma, and S. R. Bank, "Mid-Infrared Surface Plasmons on Epitaxial Semiconductors," Gordon Research Conf., Waterville, ME, Jun 2012.
  7. H. B. Yuen, S. R. Bank, M. A. Wistey, H. P. Bae, J. S. Harris, and A. Moto, "Effects of N2 Flow on GaInNAs Grown by a RF Plasma cell in MBE," Materials Research Symposium (MRS), San Franciso, CA, Apr 2004.
  8. H. B. Yuen, V. Lordi, S. R. Bank, M. A. Wistey, J. S. Harris, and A. Moto, "Analysis of Material Properties of GaNAs(Sb) Grown by MBE," Materials Research Symposium (MRS), Boston, MA, Dec 2003.
  9. H. B. Yuen, S. R. Bank, M. A. Wistey, A. Moto, and J. S. Harris, "An Investigation of GaNAs(Sb) for Strain Compensated Active Regions at 1. 3 and 1. 55 \µm," 45th Electronic Materials Conf. (EMC), Salt Lake City, UT, Jun 2003.