Role of ion damage on unintentional Ca incorporation during the plasma-assisted molecular-beam epitaxy growth of dilute nitrides using N2/Ar source gas mixtures
| Author | |
|---|---|
| Year Published |
2008
|
| Journal |
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena
|
| Volume |
26
|
| Number of Pages |
1058–1063
|
| Month Published |
12/1969
|
| URL |
https://doi.org/10.1116/1.2924329
|
| DOI |
10.1116/1.2924329
|
| Download citation |